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1.5 V, 1.6 µm CMOS, 1 PolySi, 1 Me, low threshold, 150mm wafers

1.5 V, 1.6 µm CMOS, 1 PolySi, 1 Me, low threshold, 150mm wafers

範圍 意義
Тип карточки товара Сложная
Application, features Medium-scale integration digital IC for electronic timepieces and micro calculators, VDD 1.5 V¸3 V.

 

NMOS: Vtn= 0.5 V, Usd >10 V

PMOS: Vtp= -0.5 V, Usd >10 V
Process Description Number of masks, pcs.                                                    11

Design rule,µm                                                              1.6

Substrate:           Si/ B-doped/ p-type/Res 12          2 wells                          

N/P-well depth, µm                                                        5/6

Gate SiO2, Å                                                                 300

Interlayer dielectric – BPSG

Channel length: NMOS/PMOS, µm                               2.0

space line PolySi , µm                                                    3.2    

contacts, µm                                                                Ø 1.5

space line Me, µm                                                           3.6   
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